Recent Patents on Nanotechnology

ISSN: 1872-2105 - Volume 4, 3 Issues, 2010

Editor-in-Chief:

Eduardo Ruiz- Hitzky
Department of New Architectures in Materials Chemistry
Materials Science Institute of Madrid, CSIC
Madrid
Spain

Co-Editor in Chief:

Pilar Aranda
Department of New Architectures in Materials Chemistry
Materials Science Institute of Madrid, CSIC
Madrid
Spain

Associate Editor:

Cengiz S. Ozkan
Department of Mechanical Engineering
University of California
Riverside, CA
USA

Regional Editor:

Oswaldo L. Alves
Laboratory of Solid State Chemistry (LQES)
UNICAMP
Campinas, SP
Brazil

Editorial Advisory Board:

A. Agarwal (Florida International University, Miami, FL, USA)
V.S. Aigbodion (Ahmadu Bello University, Zaria, Nigeria)
P. Alexandridis (State University of New York, Buffalo, NY, USA)
P.E. Arce (TTU, Cookeville, TN, USA)
M.R. Baklanov (IMEC, Leuven, Belgium)
C. Balázsi (Research Institute For Technical Physics And Materials Science, Budapest, Hungary)
M.I. Baraton (UMR CNRS, Limoges, France)
A.R. Barron (Rice Univ., Houston, TX, USA)
S. Barth (Fraunhofer IME, Aachen, Germany)
R. Bawa (Rensselaer Polytechnic Institute, Troy, NY, USA)
S. Bhansali (University of South Florida, Tampa, FL, USA)
S.H. Bo (Qingdao Univ. of Sci. and Tech., Qingdao, China)
J.H. Borrell (CBEN, Barcelona, Spain)
T. Burnouf (Human Plasma Product Services, Lille, France)
E. Carrilho (University of São Paulo, São Carlo, SP, Brazil)
A. Cavalcanti (CAN, Melbourne, Australia)
H.T. Chang (National Taiwan Univ., Taipei, Taiwan)
W.B. Choi (Florida International University, Miami, FL, USA)
B. Chu (State Univ. of New York, Stony Brook, NY, USA)
L. Chung-Kung (Vanung University, Chung-Li, Taiwan)
Z. Dehouche (Université Laval, Québec, Canada)
B. Ding (University of California, Davis, CA, USA)
F. Ding (Rice Univ., Houston, TX, USA)
Y. Ding (University of Leeds, Leeds, UK)
T. Djenizian (Laboratoire MADIREL, Cedex, France)
A.B. Djurisic (The Univ. of Hong Kong, Hong Kong)
P.O. Ekstrom (The Norwegian Radium hospital, Oslo, Norway)
A.A. El-Azab (Florida State University, Tallahassee, FL, USA)
D.F. Emerich (LCT BioPharma Inc., Providence, RI, USA)
C. Fernández (Instituto de Microelectrónica de Barcelona, (CSIC), Barcelona, Spain)
A. Freundlich (University of Houston, Houston, TX, USA)
S. Fukuzumi (Osaka Univ., Osaka, Japan)
M. Goldschmidt (UTHSC-H-Medical School, Houston, TX, USA)
E.M. Gomez ( Research Center on Nanoscience and Nanotechnology, Barcelona, Spain )
P.I. Gouma (State University of New York, Stony Brook, NY, USA)
G. Gruner (Univ. of California Los Angeles, Los Angeles, CA, USA)
D.T. Hayni (Central Michigan University, Mt Pleasant, MI, USA)
M. Henini (Univ. of Nottingham, Nottingham, UK)
M.C. Hersam (Northwestern Univ., Evanston, IL, USA)
C.-W. Hong (National Tsing Hua University,Hsinchu, Taiwan)
M.Z. Hu (Oak Ridge National Laboratory, Oak Ridge, TN, USA)
C.W. Huck (Univ. of Innsbruck, Innsbruck, Austria)
G.W. Jang (Material and Chemical Research Laboratories, ITRI, Taiwan)
G.B. Jiang (RCEES, Beijing, China)
Q. Jiang (Jilin University, Changchun, China)
D. Jiyan (The Hong Kong Polytechnic University, Hong Kong)
N.V. Kamanina (Vavilov State Optical Institute, St.- Petersburg, Russia)
K.K. Kar (Indian Institute of Technology Kanpur, India)
I. Karafyllidi (Democritus Univ. of Thrace, Xanthi, Greece)
V. Kasicka (Czech Academy of Sci., Prague, Czech Republic)
M.J. Kim (Drexel University, Philadelphia, USA)
B.I. Kharisov (Ciudad Universitaria UANL, Nuevo Leon, Mexico)
N.A. Kotov (Univ. of Michigan, Ann Arbor, MI, USA)
B-K. Ku (National Institute for Occupational Safety and Health, Cincinnati, OH, USA)
M.J. Kumar (Indian Institute of Technology, New Delhi, India)
T.H. Labean (Duke University, Durham, NC, USA)
S.P. Lau (Nanyang Tech. Univ, Singapore)
B.E. Layton (Drexel University, Philadelphia, PA, USA)
G. Li (Chinese Academy of Sci., Hefei, China)
X. Li (Univ. of South Carolina, Columbia, SC, USA)
C.M. Lieber (Harvard Univ., Cambridge, MA, USA)
J. Limtrakul (Kasetsart University., Bangkok, Thailand)
B.C. Lin (Chinese Academy of Sci., Dalian, China)
J.M. Lin (Chinese Academy of Sciences, Beijing, China)
Y. Lin (Pacific Northwest Nat. Lab., Richland, WA, USA)
B. Liu (Tianjin University, Tianjin, China)
C. Liu (MNTR, Urbana, IL, USA)
C.P. Liu (National Cheng Kung Univ., Tainan, Taiwan)
I. Lo (National Sun Yat-Sen University, Kaohsiung, Taiwan)
E. Mcglynn (Dublin City Univ., Dublin, Ireland)
L. Merhari (CERAMEC, Limoges, France)
C. Montemagno (Univ. of Cincinnati, Cincinnati, OH, USA)
T. Mustelin (BIMR, San Diego, CA, USA)
S.Y. Myong (Tokyo Institute of Tech., Meguro-ku, Japan)
S. Nazarpour (University of Barcelona, Barcelona, Spain)
O.N. Oliveira (Univ. of São Paulo, São Carlos, Brazil)
S. Ostapenko (University of South Florida, Florida, FL, USA)
A. Pal (Indian Institute of Technology, Kharagpur, India)
W.J. Parak (Ludwig Maximilians Univ. München, München, Germany)
D.A. Pawlicka (IQSC-USP, Sao Carlos, Brazil)
G.F. Peng (Beijing JiaoTong University, Beijing, China)
C.C. Perry (The Nottingham Trent Univ., Nottingham, UK)
S.N. Piramanayagam (Data Storage Institute, Singapore)
T. Qiu (Southeast University, Nanjing, China)
M.A. Raggi (Univ. of Bologna, Bologna, Italy)
A. Ramanavicius (Vilnius University,Vilnius, Lithuania)
A. Ramezani (Sharif University of Technology, Tehran, Iran)
W.M. Razeghi (Northwestern Univ., Evanston, IL, USA)
Z. Ren (Boston College,Chestnut Hill, MA, USA)
A. Robau Sanchez (CIMAV,Chihuahua, Chih, Mexico)
A.P.-G. Robinson (The University of Birmingham, Edgbaston, Birmingham, UK)
G. Rytwo (Tel Hai Academic College, Israel)
W.Z. Shen (Shanghai Jiao Tong Univ., Shanghai, China)
A. Simonian (Auburn University, Auburn, AL, USA)
A. Sinha (National Metallurgical Lab., Jamshedpur, India)
P. Serena (Materials Science Institute of Madrid, CSIC, Madrid, Spain)
S.B. Sinnott (Univ. of Florida, Gainesville, FL, USA)
S.K. Srivastava (Indian Institute of Technology, Kharagpur, India)
X.W. Sun (Nanyang Tech. Univ, Nanyang Avenue, Singapore)
W. Tan (University of Florida, Gainesville, USA)
R. Tenne (Helen and Martin Kimmel ctr. for nanoscale Sci., Rehovot, Israel)
A. Vazquez (INTEMA-Universidad Nacional de Mar del Plata, Argentina)
D. Wang (Max Planck Inst. of Colloids and Interfaces, Potsdam, Germany)
Z.L. Wang (Georgia Inst. of Technology Atlanta, Atlanta, GA, USA)
T.J. Webster (Brown Univ., Providence, RI, USA)
M. Wei (Univ. of Cambridge, Cambridge, UK)
A.D. Wissner-Gross (Harvard University, Cambridge, MA, USA)
R. Wu (Univ. of Florida, Gainesville, FL, USA)
H. Xu (Lund Univ., Lund, Sweden)
K. Yamamoto (Research Ins. of Inte. Med.Ctr, Tokyo, Japan)
A. Yu (University of New South Wales, Sydney, Australia)
S.F. Yu (Nanyang Technological Univ., Singapore)
A. Zemva (Univ. of Ljubljana, Ljubljana, Slovenia)
L. Zhang (The Univ. of Sydney, Sydney, Australia)
Y. Zhang (National Univ. of Singapore, Singapore, Singapore)
Y.J. Zhu (Chinese Academy of Sciences, Shanghai, China)